发明名称 MASK FOR X-RAY STEPPER
摘要 A ring (11) of pyrex glass or ceramic supports a silicon ring (12) on which a CVD inorganic membrane (13) is grown for supporting a number of mask patterns (14) in an effective pattern region (15). The edge of this region is shielded against irradiation by a band (17), outside which a substantial area (16) of chessboard pattern is formed. Voids within this area (16) are distributed so that its pattern density is equal to that of the centre (15). Deformation of the significant patterns (14) is therefore counterbalanced by the effects of the tensile or compressive forces in the surrounding area (16).
申请公布号 KR900007899(B1) 申请公布日期 1990.10.22
申请号 KR19870011653 申请日期 1987.10.20
申请人 FUJITSU CO. LTD. 发明人 NAKAKAWA KENGI
分类号 G03F1/00;G03F1/22;G03F1/68;H01L21/027;H01L21/30 主分类号 G03F1/00
代理机构 代理人
主权项
地址