摘要 |
PURPOSE:To obtain the subject composition, consisting of a prepolymer of diallyl phthalate, polyfunctional unsaturated compound, epoxy resin, epoxy resin curing agent, photopolymerization initiator, etc., suitable as solder resists and capable of forming patterns by exposure to ultraviolet rays and development with a solvent. CONSTITUTION:The objective composition, consisting essentially of (A) a prepolymer of diallyl phthalate, (B) a polyfunctional unsaturated compound, (C) a photopolymerization initiator, (D) an epoxy resin, (E) a curing agent for the epoxy resin, (F) an ultraviolet ray absorber, (G) a defoaming agent and (H) a solvent for dissolving the components (A) and (D), suitable as solder resists excellent in coating properties, contact exposure, developing properties, set-off resistance, plating elution resistance, plating reaction resistance, electrical insulating properties and heat resistance and capable of forming patterns by exposure to ultraviolet rays and development with a solvent.
|