发明名称 RESIST
摘要 PURPOSE:To improve heat resistance as well as to obtain superior sensitivity and resolution by incorporating novolak resin obtd. by condensing halogenated phenol having a specified compsn. and a phenol deriv. with a carbonyl compd. CONSTITUTION:Novolak resin obtd. by condensing halogenated phenol represented by formula I (where R1 is halogen selected among F, C and Br) and one or more kinds of phenol derivs. selected among cresol, xylenol, tert.- butylphenol and propenylphenol with a carbonyl compd. is incorporated into a resist. A positive type resist having superior sensitivity, resolution and especially superior heat resistance or a negative type resist having superior transparency can be obtd. A diazo or azido compd. is desirably incorporated into the resist as an auxiliary sensitizer.
申请公布号 JPH02254450(A) 申请公布日期 1990.10.15
申请号 JP19890077037 申请日期 1989.03.29
申请人 TOSHIBA CORP 发明人 GOKOCHI TORU;KUMAGAI AKITOSHI;TADA TSUKASA
分类号 G03F7/012;G03F7/016;G03F7/023;H01L21/027 主分类号 G03F7/012
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