发明名称 X-RAY DIFFRACTION APPARATUS
摘要 PURPOSE:To enable simultaneous observation of a broad area by a method wherein fine approx. parallel X-ray fluxes are made incident at an angle of incidence roughly parallel with a surface of an asymmetrical cut spectral crystal and refracted being reflected on the surface of the spectral crystal to admit diffraction X rays into a sample surface. CONSTITUTION:An X-ray source of an X-ray tube X has an electron beam converged in linearity on a target being turned to roughly parallel fine X-ray fluxes with slits S1 and S2. An asymmetrical cut spectral crystal Cn and a sample C2 are placed on goniometers G1 and G2 respectively. Here, the sample C2 is a single crystal sample and when parallel fluxes of monochromatic X rays are made incident into the entire surface thereof to cause a diffraction reflection, diffraction X rays are parallel completely with no defect and an X-ray illuminance of the surface of an X-ray film becomes uniform as placed at a position of a detector D. When a detect exists on the surface of the crystal, a diffraction state changes at this part and an image indicating a defect distribu tion is obtained on the film. Moreover, when a slit is inserted between the crystal Cn and the sample 2, a small area of an X-ray diffraction pattern can be observed on the surface of the sample.
申请公布号 JPH02254347(A) 申请公布日期 1990.10.15
申请号 JP19890077558 申请日期 1989.03.28
申请人 SHIMADZU CORP 发明人 ISHIDA HIDENOBU;NAKANISHI NORIAKI
分类号 G01N23/201 主分类号 G01N23/201
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