发明名称 PATTERN MASKING METHOD AND AN APPARATUS THEREFOR
摘要 A binarised image data group of an inspected object for multiple pixels arrayed in the sub-scanning direction is sequentially created in order along the main scanning direction to determine whether or not the pattern of an inputted image corresponds to a standard through-hole pattern on the basis of the binarised image data group. When the determination is of yes, through-hole diameter masking data are sequentially created in order along the main scanning direction to sequentially perform masking processing on the binarised image data group of the inspected object arrayed in the sub-scanning direction. Thus, the throug-hole pattern is automatically detected to be subjected to masking processing, whereby an inspected object having throughhole can be inspected by a pattern matching method.
申请公布号 KR900007548(B1) 申请公布日期 1990.10.15
申请号 KR19860007457 申请日期 1986.09.06
申请人 DAINIPPON SCREEN MFG.CO.,LTD. 发明人 HOKI TETSUO;SANO TETSUO;KITAKADO RYUJI;SAZAKI YOSHINORI;HOTTA TOMIJI;RANO HIRONOBU
分类号 G06K9/00;(IPC1-7):G06K9/00 主分类号 G06K9/00
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