| 摘要 |
PURPOSE:To easily etch a thin gold film vacuum-deposited on a base plate, by dipping the thin gold film in an aqueous alkali hydroxide solution. CONSTITUTION:When a thin gold film vacuum-deposited on a base plate is dipped in an aqueous solution containing 1wt% or more an alkali metal hydroxide such as KOH, NaOH and LiOH, the thin gold film can be easily etched. According to this method, it is not necessary to use any special vessel for etching, noxious gas is not formed during etching, and the disposal of waste liquid is facilitated, different from an etching method using aqua regia. In addition, the etching result is equal or superior to that in the case using aqua regia. |
