METHOD OF PRODUCING A SEMICONDUCTOR DEVICE BY METAL SPUTTERING,申请号EP19890313630-传众专利搜索

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发明名称	METHOD OF PRODUCING A SEMICONDUCTOR DEVICE BY METAL SPUTTERING
摘要
申请公布号	EP0376709(A3)	申请公布日期	1990.10.10
申请号	EP19890313630	申请日期	1989.12.28
申请人	FUJITSU LIMITED	发明人	INOUE, MINORU;WATANABE, KIYOSHI;HARIU, TAKENORI
分类号	H01L21/3205;H01L21/285;H01L21/768;(IPC1-7):H01L21/285;H01L21/320	主分类号	H01L21/3205
代理机构		代理人
主权项
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