Ion beam generator for semiconductor processing

摘要

The generator has a supply system for atoms of material, the supply system feeding a particle beam with the atoms to preset region. Laser beams are supplied to the region by a laser generator, in order to energise the material atoms into a Rydberg state. The atoms in the latter state are exposed to a preset electric field from a semiconductor assembly. Thus the material atoms are ionised and guided into a preset direction. The field generating assembly pref. comprises a substrate with an oppositely located electrode, supplied by a preset potential from a current supply. Thus generating the required electric field between the electrode and substrate.