PRODUCTION OF MASK FOR SPUTTERING AND SUBSTRATE WITH PATTERNED COATING FILM FORMED BY SPUTTERING,申请号JP19890071451-传众专利搜索

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发明名称	PRODUCTION OF MASK FOR SPUTTERING AND SUBSTRATE WITH PATTERNED COATING FILM FORMED BY SPUTTERING
摘要
申请公布号	JPH02250954(A)	申请公布日期	1990.10.08
申请号	JP19890071451	申请日期	1989.03.23
申请人	TOPPAN PRINTING CO LTD	发明人	HATAJIMA MITSUHISA
分类号	C23C14/04;C03C17/245	主分类号	C23C14/04
代理机构		代理人
主权项
地址

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