| 摘要 |
PURPOSE:To enhance sensitivity and resolution to radiations, especially, exicimer laser beams by incorporating an alkali-soluble resin, a specified compound and a compound to be allowed to release and acid by photoirradiation. CONSTITUTION:The photosensitive composition contains an alkali-soluble resin, the compound represented by formula I (in which each of R1 - R6 is H, OH, or optionally substituted 1 - 20 C alkyl, and the like, at least one of R1 - R6 is a tetrahydropyranyl ether group), and the compound to be allowed to release an acid by photoirradiation, thus permitting the composition film exposed to radiation to release the acid from a photo-acid-generating agent in the photoirradiation part of the film, to replace the tetrahydropyranyl ether group of the resin by the hydroxy group of the resin, thus to solubilize the resin in alkali, to dissolve only the photoirradiation parts of the film by developing it with an aqueous alkaline developing solution, thus to form a positive image, and consequently, the obtained photosensitive composition to be high in sensitivity to radiations, especially to excimer laser beams. |
