| 摘要 |
PURPOSE:To enhance sensitivity and resolution to radiations, especially, exicimer laser beams by incorporating a specified resin and a compound to be allowed to release an acid by photoirradiation. CONSTITUTION:The photosensitive composition contains a resin obtained by substituting the hydroxy group of an alkali-soluble resin with tetrahydropyranyl ether group and the compound to be allowed to release an acid by photoirradiation, thus permitting the composition film exposed to radiation to release the acid from a photo-acid-generating agent in the photoirradiation part of the film, to replace the tetrahydropyranyl ether group by the hydroxy group of the resin, to dissolve the photoirradiation parts of the film by developing it with an aqueous alkaline developing solution, thus to form a positive image, and consequently, the obtained photosensitive composition to be high in sensitivity to radiations, especially to excimer laser beams. |
