Radiation sensitive polymers and use thereof

摘要

Organometal-containing polymers having side chains of the formula I (I) in which, for example, M is Si, X is O, R1 and R2 are hydrogen and R4 to R6 are each methyl and which have an average molecular weight between 1,000 and 1,000,000, are suitable for the preparation of dry-developable photoresists, such as are required for the generation of structured images, in particular in microelectronics.