发明名称 Method for reducing the charge carrier lifetime
摘要 A method for reducing the charge carrier lifetime in a semiconductor component involves subjecting a semiconductor substrate (1), in order to generate recombination centres (4), to irradiation with high-energy protons (3) and, in order to ensure thermal long-term stability, subjecting it to tempering. The tempering step is carried out at an optimum temperature of from 260@C to 300@C for at least 30 minutes. The irradiation takes place after the metallisation process, and the tempering step is carried out in high vacuum. <IMAGE>
申请公布号 DE3910609(A1) 申请公布日期 1990.10.04
申请号 DE19893910609 申请日期 1989.04.01
申请人 ASEA BROWN BOVERI AG, BADEN, AARGAU, CH 发明人 BEELER, FRANZ, DIPL.-PHYS. DR., BADEN, CH;HUEPPI, MARCEL, DIPL.-PHYS., ZUERICH, CH
分类号 H01L21/263;H01L21/324;H01L29/32 主分类号 H01L21/263
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