| 摘要 |
An apparatus for forming a thin film having a vacuum container evacuated to high vacuum and receiving a gas for vapor deposition, a generation device for generating a material vapor, a counter electrode holding a substrate to be vapor-deposited, a first grid disposed between the generation device and the electrode for accelerating the vapor, and a filament for emitting thermions to ionize the vapor. The first grid and counter electrode surfaces may be curved and parallel to each other, and a second grid for accelerating the vapor, having a potential which is negative with respect to the potential of the first grid, may be placed between the first grid and the electrode, in the vicinity of the electrode, and a device may be provided for moving the first grid with respect to the electrode on a predetermined track.
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