| 摘要 |
PURPOSE:To obtain a quartz glass core tube for a furnace for semiconductor treatment having a superior uniform heating effect and a long life and causing little thermal deformation, by manufacturing quartz glass while controlling the diameter and amount of bubbles to be contained and by working the quartz glass. CONSTITUTION:High purity quartz glass as a starting material is introduced into a rotating container and melted by heating from the inside to manufacture quartz glass. At this time, quartz glass contg. bubbles of 15-100mum diameter by 2-9X10<-3>cm<3> in total per 1cm<3> quartz glass and having <=200ppm OH concn. is manufactured by regulating the grain size of the starting material, the number of revolutions, the melting temp., the melting time, etc. The quartz glass is worked to obtain the desired quartz glass core tube for a furnace for semiconductor treatment. |
