METHOD FOR SIMULTANEOUSLY MACHINING BOTH SIDES OF DISC-SHAPED WORK PIECES, ESPECIALLY SEMICONDUCTOR WAFERS

摘要

A process is provided for bilateral abrasive machining of wafer-like workpieces, especially semiconductor wafers. The process uses carrier disks in which the outer periphery on which the driving forces mesh, is made of a material having a tensile strength of at least 100 N/mm2, while in the area that comes into contact with the workpieces to be machined, there is provided a plastic material having an elasticity modulus of from 1.0 to 8.104 N/mm2.