发明名称 Tri-deflection electron beam system.
摘要 <p>A three-stage E-beam deflection system employs breaking the entire field to be scanned into clusters and sub-fields. The scanning provided by the first stage of deflection which scans within the entire field is rectilinear and discontinuous with the scan stopping in the center of each of the clusters where an exposure is to be made, and scanning is the same within each cluster from sub-field to sub-field. The scanning within a cluster by the second stage stops in the center of each sub-field where exposure is to be made. The third stage uses high speed electrostatic deflection to provide scanning with a vector scanning mode within the sub-field being scanned.</p>
申请公布号 EP0389398(A2) 申请公布日期 1990.09.26
申请号 EP19900480024 申请日期 1990.02.20
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 DAVIS, DONALD EUGENE;HO, CECIL TZECHOR;LIEBERMAN, JON ERIK;PFEIFFER, HANS, CHRISTIAN;STURANS, MARIS ANDRIS
分类号 H01J37/147;H01L21/027;H01J37/302 主分类号 H01J37/147
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