X-ray exposure apparatus.

摘要

An X-ray exposure apparatus includes an X-ray source; and a directing optical system for directing an X-ray beam from the X-ray source to a surface to be exposed, the directing optical system including a mirror having a reflection surface of a curvature radius R with respect to a predetermined sectional plane, for reflecting the X-ray beam and for expanding the diameter thereof with respect to the sectional plane; wherein the mirror satisfies the following conditions: R = (2d1d2 sigma min )/{[ DELTA -(d1+d2) sigma min ]. alpha } where d1: the distance from the emission point of the X-ray source to the center of effective X-ray beam diameter on the reflection surface; d2: the distance from the center of effective X-ray beam diameter on the reflection surface to the center of effective X-ray beam diameter on the surface to be exposed; alpha : the angle defined at the center of effective X-ray beam diameter on the reflection surface, between the X-ray beam and the reflection surface; sigma min : a standard deviation of a distribution of intensities of the rays having different emission angles at the sectional plane, at the gravity center wavelength of the X-ray beam from the X-ray source; DELTA : 0.43a