发明名称 |
HETERO-EPITAXIAL LIQUID PHASE GROWTH METHOD AND APPARATUS THEREFOR |
摘要 |
A hetero-epitaxial liquid phase growth method for growing a compound semiconductor by liquid phase epitaxy includes placing a melt in a closed melt boat on a substrate and epitaxially growing a first thin film, opening the melt boat while the melt remains in a melted state for a predetermined time to evaporate a component of the melt, and epitaxially growing a second thin film on the first thin film from the melt from which the component has been evaporated. |
申请公布号 |
GB9017847(D0) |
申请公布日期 |
1990.09.26 |
申请号 |
GB19900017847 |
申请日期 |
1990.08.14 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
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分类号 |
C30B19/10;C30B19/04;C30B19/06;H01L21/208;H01L21/368 |
主分类号 |
C30B19/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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