发明名称 HETERO-EPITAXIAL LIQUID PHASE GROWTH METHOD AND APPARATUS THEREFOR
摘要 A hetero-epitaxial liquid phase growth method for growing a compound semiconductor by liquid phase epitaxy includes placing a melt in a closed melt boat on a substrate and epitaxially growing a first thin film, opening the melt boat while the melt remains in a melted state for a predetermined time to evaporate a component of the melt, and epitaxially growing a second thin film on the first thin film from the melt from which the component has been evaporated.
申请公布号 GB9017847(D0) 申请公布日期 1990.09.26
申请号 GB19900017847 申请日期 1990.08.14
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人
分类号 C30B19/10;C30B19/04;C30B19/06;H01L21/208;H01L21/368 主分类号 C30B19/10
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