发明名称 Light-sensitive o-quinone diazide composition and product with phenolic novolak prepared by condensation with haloacetoaldehyde
摘要 A phenolic novolak resin comprising the product of a condensation reaction of an aldehyde comprising a haloacetaldehyde source or a mixture of a haloacetaldehyde source and a formaldehyde source with a phenolic monomer comprising at least one compound of the formula: <IMAGE> wherein R1, R2 and R3 are individually selected from hydrogen or a one to four carbon alkyl group and wherein the ratio of total carbon atoms in the sum of R1, R2 and R3 to the total number of phenolic nuclei in said resin is from about 0.5:1 to about 1.5:1 in the presence of a solvent; said resin made by employing a molar ratio of total aldehyde to total phenolic monomers from about 0.33:1 to about 0.70:1. These phenolic resins are suitable for use in light-sensitive compositions (e.g. positive-working photoresists).
申请公布号 US4959292(A) 申请公布日期 1990.09.25
申请号 US19880217512 申请日期 1988.07.11
申请人 OLIN HUNT SPECIALTY PRODUCTS INC. 发明人 BLAKENEY, ANDREW J.;SARUBBI, THOMAS;SIZENSKY, JOSEPH J.
分类号 C08G8/04;C08G8/12;C08K5/42;C08L61/04;C08L61/06;C09D161/06;C09D161/20;C09D167/06;G03F7/023;H01L21/027;H01L21/30 主分类号 C08G8/04
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