ANTIREFLECTION COATINGS AND COMPOUNDS USEFUL THEREFOR

摘要

ANTIREFLECTION COATINGS AND COMPOUNDS USEFUL THEREFOR There are disclosed antireflecting compounds and layers used in admixture with or adjacent to a positive-working, non-silver halide photosensitive layer. The compounds have the structural formula: wherein R1, R2, R3 and R4 are individually alkyl, thiazole, pyridine or a carbocyclic ring; or together R1 and R2 or R3 and R4 or R1 and R3 or R2 and R4 are the atoms to complete a heterocyclic ring; R5, R6 and R7 are individually H or alkyl; or together R5 and R6 comprise the atoms to complete a ring of from 5 to 6 carbon atoms; n is 0 or 1; and X is an anion. The resulting antireflecting layers have unexpected thermal resistances, needed for the thermal planarization usually given to such photoresists.