| 摘要 |
<p>PURPOSE:To allow the light shielding of non-picture element regions without exerting adverse influence on switching characteristics by forming a 1st wiring layer connected electrically to a 2nd wiring layer to the area to cover elements for an active matrix on a transparent insulating layer and the substrate projection region on the 2nd wiring layer. CONSTITUTION:The 1st wiring layer 50 has the area to cover the elements M for the active matrix on the transparent insulating layer 60 and the substrate projection region of the 2nd wiring layer 80. Namely, the transparent insulating layer 60 is laminated and provided over the entire surface of a transparent substrate 10 on the 1st wiring layer 50 and the 2nd wiring layer 80 and the elements M for the active matrix are disposed on the transparent insulating layer 60. The 1st wiring layer 50 and the 2nd wiring layer 80 are electrically connected via contact holes, etc., provided on the transparent insulating layer 60 in conformity with the arrangement pitch of, for example, transparent picture element electrodes 70 in the non-picture element regions. The light shielding of the non-picture element regions is executed in this way without exerting the adverse influence on the switching characteristics of the elements for the active matrix.</p> |
