发明名称 Method for producing interconnects on a substrate panel for liquid-crystal cells
摘要 In the case of a method for producing interconnects on a substrate panel for liquid-crystal cells, a short-circuit test is carried out even when there are still photoresist tracks on the interconnects. The photoresist tracks are not removed until after the short-circuit test. In the case of known methods, on the other hand, the short-circuit test was not carried out until the entire production process for the interconnects had been completed. The procedure according to the invention has various advantages. One is that the interconnects are still mechanically protected by the photoresist tracks located over them during the short-circuit test. A further, very significant advantage is that the already existing photoresist material can be used to allow rectification of short circuits in a simple manner. Specifically, if short circuits are detected, the short-circuit points are located and the interconnect is exposed in this area by removal of the photoresist, the short-circuiting area of the conductive layer then being locally removed. The photoresist tracks are not removed until this has been done.
申请公布号 DE3908068(A1) 申请公布日期 1990.09.20
申请号 DE19893908068 申请日期 1989.03.13
申请人 NOKIA UNTERHALTUNGSELEKTRONIK (DEUTSCHLAND) GMBH, 7530 PFORZHEIM, DE 发明人 BROSIG, STEFAN, DR., 7000 STUTTGART, DE
分类号 G03F7/00;H05K3/06;H05K3/22 主分类号 G03F7/00
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