| 摘要 |
The manufacturing method includes the steps of; (a) forming a flat layer on the black-and-white CCD wafer with photodiode domain(2), electric charge transmission domain and pad domain(3); (b) forming transparent adbering layer(9) at main pixel domain on the flat layer, made by using adhering solution after coating with caseine or gellatin and photoetching; (c) forming color filter layer(4,5,6,7) which is composed of the 1st, 2nd, 3rd and 4th dyeing layers; (d) forming top layer on the front side with thermosetting resin and exposing pad domain(3).
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