发明名称 FORMATION OF FILM
摘要 PURPOSE:To form a diamond-like thin film on the surface of a substrate to be treated by maintaining a reduced pressure state in a reaction chamber contg. the substrate, introducing a gaseous mixture satisfying the relation of specific ratios of C, O2 and H2 into the chamber and impressing magnetic fields and microwaves from the outside. CONSTITUTION:After the substrate 8 to be treated is fixed to a holding base 6 in the reaction chamber 1, the inside of the reaction chamber 1 is evacuated and reduced in pressure. Gaseous alcoholic hydrocarbon, such as ethanol, metha nol, propyl alcohol, etc., and gaseous H2 are introduced as gaseous raw materials from a gas introducing system 10 into the chamber. The magnetic fields and microwaves are impressed to the gaseous raw materials by an external magnetic field generator 5 and a microwave generator 4 to generate high-density plasma and to form the C generated by cracking of the hydrocarbon as the diamond-like ultra-hard thin film on the surface of the substrate 8. The ratio of H/C is adjusted to 20 to 40, 7 to 15, 3 to 12 in the case of 1/1, 2/1, 3/1 O/C of the gaseous raw material mixture in this case, by which the diamond-like thin carbon film is formed on the substrate 8.
申请公布号 JPH02236280(A) 申请公布日期 1990.09.19
申请号 JP19890057167 申请日期 1989.03.09
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 SUMINO SHINYA
分类号 C01B31/02;C23C16/26;C23C16/27;C30B29/04;C30B29/64 主分类号 C01B31/02
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