| 摘要 |
PURPOSE:To suppress the etching time dependency of the dimension of a pattern by bringing an arbitrary pattern to picture drawing to an outside peripheral part, etc. of an object pattern, and adjusting an etching speed. CONSTITUTION:To an object pattern part 2 provided on a prescribed part of a substrate 1 to which a resist is applied, an object prescribed pattern is brought to picture drawing. Also, to a suitable area 3 of the outside of the object pattern part 2, an arbitrary pattern is brought to picture drawing. In such a way, by adjusting an etching area, the etching time can be adjusted, and the etching time dependency of the dimension of an object pattern can be lowered. |
