发明名称 Susceptor for vapour growth apparatus
摘要 A susceptor for use in a vertical vapor growth apparatus includes a susceptor body (12) having an upper surface, a plurality of wafer receiving portions (17) formed in the upper surface of the susceptor body (12), and plates (16) fixed in the upper surface of the susceptor body (12) near the wafer setting portions (17). The plates (16) have an upper surface such that, when wafers (5) are mounted in the wafer setting portions (17), the upper surfaces of the plates (16) and the wafers (5) are positioned substantially in the same plane. The plates (16) are made of quartz glass or fused silica.
申请公布号 GB2229195(A) 申请公布日期 1990.09.19
申请号 GB19890029318 申请日期 1989.12.29
申请人 * TOSHIBA CERAMICS CO LTD 发明人 EIICHI * TOYA;YUKIO * ITOH;TADASHI * OHASHI;MASAYUKI * SUMIYA;YASUMI * SASAKI
分类号 C30B25/12;C23C16/44;C23C16/458;H01L21/205;H01L21/31 主分类号 C30B25/12
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