| 摘要 |
<p>PURPOSE:To put the contact of the front surface of alight shielding material and a resist layer into point contact and to prevent sticking of both by imparting very small ruggedness on the front surface of the light shielding material of the mask. CONSTITUTION:A transparent substrate 1, such as glass plate, is put into a magnetron sputtering device or the like and, for example, a Cr film 2b is formed on the substrate 1. A negative bias is then impressed to the substrate 1 and a Cr film 2c is formed on the film 2b. Since the film 2c is sputtered again by a negative bias at this time, the Cr particles enlarge and the very small ruggedness 2a is formed on the front surface of the film 2c. Desired patterns 10 are then formed by a photoresist on the film 2c and after patterns P are formed of the layers 2c, 2b by etching, the patterns 10 are removed. The mask is thus produced.</p> |
