Process for making electron sources of the field-emission type and devices made from the said sources

摘要

The process of the invention consists in depositing successively on a monocrystalline substrate 1 a dielectric layer 2, a grid layer 3, another dielectric layer 4 made of a different material from that of the first, a cavity is etched into the three layers and a cathode tip 9 is formed on the substrate by selective and faceted epitaxial growth. <IMAGE>