DEVICE AND METHOD FOR FORMING LITHOGRAPHIC PATTERNS USING AN INTERFEROMETER

摘要

The invention concerns a method for forming lithographic patterns in a sensitive material layer (14) by subjecting said layer to at least an exposure beam (12). The invention is characterised in that it consists in passing the exposure beam through an interferometer (18) equipped with at least two superposed periodic networks to expose the sensitive material layer according to an interference pattern called "moiré" pattern. The invention is useful, for example, for making electrical or optical components with nanostructures or microstructures.