发明名称 Device for characterizing semiconductor samples by photoluminescence with high spatial resolution and at low temperature
摘要 A device is described for characterizing wafers of semiconductor materials by photoluminescence with high spatial resolution and at low temperature, this device comprising at least: (a) a cryostatic vacuum chamber provided with a cooled sample carrier adapted to receive the wafer and provided with at least one window for the transmission of the light beams implied in the photoluminescence process; (b) optical means for forming a luminous spot on the wafer from a laser beam and for transmitting the re-emitted photoluminescence beam to a detector, characterized in that the optical means comprise first optical means for forming on the wafer from the laser beam a wide unfocused luminous spot and second optical means with high resolution for forming with a magnification exceeding unity on the receiving surface of the detector the image of photoluminescence of the surface of the luminous spot, and in that the detector is apt to produce a digitized image thereof.
申请公布号 US4954713(A) 申请公布日期 1990.09.04
申请号 US19890377361 申请日期 1989.07.07
申请人 U.S. PHILIPS CORPORATION 发明人 LE BRIS, JEAN;ERMAN, MARKO;GILLARDIN, GERARD
分类号 G01N21/64;G01R31/265;H01L21/66 主分类号 G01N21/64
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