| 发明名称 |
POSITIVE PHOTORESIST COMPOSITIONS |
| 摘要 |
<p>20731-904 Disclosed is a positive-working radiation-sensitive coating solution containing a polymeric binder which is insoluble in water and soluble in aqueous-alkaline solutions, a radiation-sensitive compound and an organic solvent or mixture of solvents with a propylene glycol alkyl ether acetate. The solution has an improved photospeed and is less injurious to health. Hoe 84/K 100</p> |
| 申请公布号 |
CA1273522(A) |
申请公布日期 |
1990.09.04 |
| 申请号 |
CA19850483297 |
申请日期 |
1985.06.06 |
| 申请人 |
HOECHST CELANESE CORPORATION |
发明人 |
PAMPALONE, THOMAS R. |
| 分类号 |
G03C1/72;G03F7/022;H01L21/027;(IPC1-7):G03F7/016;G03F7/16 |
主分类号 |
G03C1/72 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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