| 摘要 |
PURPOSE:To obtain a water developable material for a lithographic plate with superior storage stability by forming a photosensitive layer on a substrate with a composition contg. an aqueous emulsion of acrylic resin having a specified minimum film forming temp. and a photosensitive substance. CONSTITUTION:A photosensitive layer is formed on a substrate with a composition contg. an aqueous emulsion of acrylic resin and a photosensitive substance changing the solubility in water on being irradiated with ultraviolet rays. The emulsion has >=45 deg.C minimum film forming temp., and the amount of the photosensitive substance is 30-300pts.wt. to 100pts.wt. emulsion as a solid. The preferred photosensitive substance is a diazo resin such as the condensate of a carbonyl compound with a diazo compound. The aqueous emulsion of acrylic resin is prepared by emulsion-polymerizing a monomer such as (meth)acrylic acid or a styrene compound in an aqueous medium. |
