FORMING METHOD FOR GLASS FILM SUING PLASMA CHEMICAL VAPOR DEPOSITION SYSTEM

摘要

PROBLEM TO BE SOLVED: To confine the number of particles of >=1μm adhered on a substrate to a prescribed number or below when forming a glass film by a plasma enhanced CVD method. SOLUTION: Predeposition is carried out prior to a process step for depositing the glass film on the substrate to prevent the adhesion of the particles 115 already adhered in a chamber 101 onto the substrate under deposition and gaseous raw material is reacted on the substrate surface without being reacted in a gaseous phase, by which the number of the particles of >=1μm adhered on the substrate is specified to the prescribed number or below.