发明名称 |
ABRASIVE MATERIAL RECOVERING DEVICE |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide an abrasive material recovery device for efficiently recovering abrasive particles from waste water which contains abrasive material and is discharged out in a CMP process, which is employed in a semiconductor manufacturing factory or the like. SOLUTION: An abrasive material recovering device for recovering abrasive material from waste water discharged out in a CMP process is equipped with a film-separating means, to which waste water discharged out in a CMP process is introduced and a cleaning means which rinses a concentrated water obtained by the film separating means with water.</p> |
申请公布号 |
JP2002016027(A) |
申请公布日期 |
2002.01.18 |
申请号 |
JP20000192937 |
申请日期 |
2000.06.27 |
申请人 |
KURITA WATER IND LTD |
发明人 |
MATSUMOTO AKIRA;HAYASHI KAZUKI |
分类号 |
B24B57/02;B01D61/14;B24B37/00;C02F1/00;C02F1/44;H01L21/304;(IPC1-7):H01L21/304 |
主分类号 |
B24B57/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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