发明名称 NOVEL ELECTRODEPOSITION COATING SYSTEM HAVING IMPROVED IMPACT AND CHIP RESISTANCE
摘要 The present invention provides a resin which is a mixture of a) the product of a diol and one or more diepoxides and b) an A-B-A block copolymer wherein A represents blocks of an epoxy/diol copolymer wherein A reaction product of a diol and a diepoxide, and B represents blocks of an expoxy-capped, carboxylterminated polybutadiene or polybutadiene/ acrylonitrile copolymer. Amine resins, produced by reaction of this resin with an amine are useful as the principal resin in electrocoating formulations which produce deposited films having excellent corrosion resistance and improve impact and chip resistance. 53
申请公布号 CA2010819(A1) 申请公布日期 1990.08.31
申请号 CA19902010819 申请日期 1990.02.23
申请人 HARRIS, PAUL J.;WOJCIK, RONALD T. 发明人 HARRIS, PAUL J.;WOJCIK, RONALD T.
分类号 B05D7/14;C08G18/58;C08G59/00;C08G59/14;C08G81/02;C08L53/02;C08L63/00;C09D5/44;C09D163/00;C25D13/06;(IPC1-7):C09D163/00;C25D13/08;C09D5/24 主分类号 B05D7/14
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