| 摘要 |
PURPOSE: To determine and measure a position without an individual difference relating to a dimension of a specific pattern designated by a person in measuring a dimension of a long continuous pattern over a wide range such as a wiring pattern by an automatic dimension measuring device with respect to a fine pattern such as a LSI circuit in manufacturing a semiconductor. CONSTITUTION: This device for measuring a dimension of the fine pattern existing on the LSI circuit, has an automatic alignment and automatic reference point adjustment function, a function for measuring the coordinate and distance to an arbitrary designated position to be measured from the alignment point and reference point, a function for automatically measuring a dimension of the designated arbitrary pattern, and a function for executing the automatic totalizing and statistical processing on the dimension of the measured pattern.
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