发明名称 PHOTOMASK BLANK AND PHOTOMASK
摘要 <p>PURPOSE:To enable finer fabrication and to reduce variation of dimensions by successively laminating an undercoat layer, a light shading layer, and a surface reflection preventive layer on a transparent base plate and specifying materials for constituting these 3 layers. CONSTITUTION:The undercoat layer is made of a nickel-chromium alloy containing at least one kind of element selected from O and N, the light shading layer is made of chromium alone or chromium adding at least one of C, F, N, and the like, and the reflection preventive layer is made of the material adding at least one of O, N, F, and the like to chromium, thus permitting side etching to be reduced, the cross section of a pattern to be made perpendicular, and variation of dimensions to be reduced by raising the electrochemical potentials of the 3 layer structures successively from the upper layer.</p>
申请公布号 JPH02219057(A) 申请公布日期 1990.08.31
申请号 JP19890040107 申请日期 1989.02.20
申请人 TOPPAN PRINTING CO LTD 发明人 HIGUCHI SHOICHI;MURAKI AKIRA
分类号 G03F1/46;G03F1/50;G03F1/54;G03F1/58;H01L21/027;H01L21/30 主分类号 G03F1/46
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