发明名称 HIGH FREQUENCY INDUCTION COUPLING PLASMA MASS SPECTROGRAPH
摘要 PURPOSE:To enable ease and accurate alignment by a method wherein a solid or liquid sample is vaporized to mix a carrier gas with a fixed concentration of component, and alignment is achieved between plasma torch and a sampling nozzle. CONSTITUTION:An argon gas is supplied to a high frequency induction plasma mass spectrograph 130 passing through a flow rate controller 110 and a gas generator 120. When by a command of a controller 140, the device 120 is heated to raise the inside of the device up to a high temperature, a solid sample 122 is vaporized corresponding to a vapor pressure at the temperature. As a result, the device 120 is filled with a gas containing a component with a density thereof corresponding to a temperature controlled with the controller 140b. The gas thus filled is carried to an analyzer 130 on a carrier gas. This enables alignment of a plasma torch even in an analysis method that only obtain a transient measurement signal as in a laser abrasion and ETV method.
申请公布号 JPH02216047(A) 申请公布日期 1990.08.28
申请号 JP19890037129 申请日期 1989.02.16
申请人 YOKOGAWA ELECTRIC CORP 发明人 YAMANAKA KAZUO
分类号 G01N27/62;H01J49/10;H01J49/12 主分类号 G01N27/62
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