| 摘要 |
The invention provides a reflective electrooptic device and an electronic apparatus using the reflective electrooptic device described above. In the reflective electrooptic device, variation in irregular shape is avoided or reduced by maintaining uniform conditions at the lower layer side of an irregularity-forming layer when being formed by a photolithographic technique. In a TFT array substrate of a reflective electrooptic device, an irregularity-forming layer to form an irregular pattern on a light reflection film is formed by half exposure, development, and heating performed for a photosensitive resin. At a lower layer side of the irregularity-forming layer, since a height difference, i.e., a step is eliminated by a step-eliminating film, exposure can be preferably performed for the photosensitive resin. In addition, since the height difference is eliminated, variation in thickness of the photosensitive resin is small, and hence variation in irregular shape becomes small.
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