| 摘要 |
PURPOSE:To shorten the time for checking and to improve productivity by patterning and forming the line address base patterns of the line width nearly equal to the min. resolving power of a reduction stepper vertically and horizon tally so as to cover the exposing region on a transparent substrate. CONSTITUTION:The reticule 10 is constituted by forming the line and space patterns 10b consisting of, for example, chromium Cr, of the prescribed line width vertically and horizontally on the transparent substrate 10a consisting of glass, etc., so as to cover at least the entire surface of the exposing region of the reduction stepper. The line width of the reduced reticule transfer patterns on the wafer obtd. by subjecting the wafer to an ordinary development processing afterward is matched nearly with the min. resolving power of the device and, therefore, the transfer patterns form the separated resolution regions only near the best focus position and the non-resolution regions are formed and are identifiable by naked eyes the furtherer from the focus position. The need for a microscope is eliminated in this way and the time for checking is drastically shortened. The productivity of the semiconductor wafer is thus improved. |
