| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus and a method capable of effectively masking a part of a mask of a lithography projection apparatus during scanning and a static exposure. SOLUTION: A lithography apparatus comprises a masking device for covering at least a part of patterning means used for patterning a projected beam, before image formation of a patterned beam is performed on a substrate. The masking device comprises a first masking means for covering the part of the patterning means in a first direction and a second masking means for covering the part of the patterning means in a second different direction, and the first and second masking means are not mutually mechanically connected and arranged near the focal surface. COPYRIGHT: (C)2005,JPO&NCIPI |
