| 摘要 |
Photoresist compositions Positive-working photoresist compositions containing 23-27%, based on said composition, of at least one compound of formula (I) (I), wherein one of the substituents X is hydrogen or a group of formula II (II) and the other substituents X are a group of formula II; and 6-11%, based on said composition, of at least one polyhydroxy compound of formula III (III), wherein X is a direct bond, -O-, -S-, -SO2-, -CO- or C(R6(R7)-, and R1, R2, R3, R4 and R5 are each independently of the other hydrogen, halogen, C1-C4alkyl, C1-C4alkoxy or hydroxy, and R6 and R7 are each independently of the other hydrogen, -CH3 or C13 These compositions have particularly good profile contrast and exhibit insignificant fluctuations in line width.
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