发明名称 |
Optimizing focal plane fitting functions for an image field on a substrate |
摘要 |
A sample for generating feedback for adjusting focal plane fitting values of an exposure tool by product shot comprises a product wafer, an opaque material layer adjacent the product wafer, and a blazed phase grating patterned layer adjacent the opaque material layer.
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申请公布号 |
US2006193532(A1) |
申请公布日期 |
2006.08.31 |
申请号 |
US20050121579 |
申请日期 |
2005.05.04 |
申请人 |
ROBERTS WILLIAM;GRACA STEVE |
发明人 |
ROBERTS WILLIAM;GRACA STEVE |
分类号 |
G06K9/40 |
主分类号 |
G06K9/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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