发明名称 RETICLES AND METHODS OF FORMING RETICLES
摘要 The invention includes reticles and methods of forming reticles. In one aspect, a reticle can include a quartz-containing substrate, an attenuating layer, and an antireflective structure between the attenuating layer and the quartz-containing substrate. The invention can also include a reticle having a relatively transparent region between first and second surfaces, a relatively opaque region proximate the first surface, and a layer comprising one or both of metal fluoride and hafnium oxide proximate the first or second surface. The invention can also include methods of forming reticles in which an antireflective structure is formed over a surface of a quartz-containing substrate. The antireflective structure can comprise a Fabry-Perot pair, and in some aspects can comprise a. layer containing one or both of metal fluoride and hafnium oxide.
申请公布号 WO2006060620(A3) 申请公布日期 2006.08.31
申请号 WO2005US43549 申请日期 2005.12.01
申请人 MICRON TECHNOLOGY, INC. 发明人 ROLFSON, BRETT, J.
分类号 G03F1/14 主分类号 G03F1/14
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