| 摘要 |
<p>In a microwave plasma processing method and apparatus, the electromagnetic field intensity distribution of the microwaves, which is incident into a plasma generation chamber (2) and is again incident due to irregular reflection, is made uniform by means (15) fixed inside a waveguide (3). A processing gas is converted to plasma by the microwaves having uniform electromagnetic field intensity distribution, and a sample is plasma-processed. Accordingly, the electromagnetic field of the microwave, which is incident, and is again incident, into the plasma generation region and locally increases a plasma density, is absorbed, attenuated or diffused so that the distribution of the plasma density is made uniform and uniform processing can be effected.</p> |
