发明名称 |
Process for the vapor deposition of polysilanes. |
摘要 |
<p>Disclosed is a process for forming a film comprising a polysilane composition on a substrate. The film is formed by vapor deposition directly on a substrate, thus avoiding the cumbersome steps ordinarily encountered in preparing and applying polysilanes by conventional spin application techniques. The film is used in a lithographic process for forming an image on a substrate.</p> |
申请公布号 |
EP0382932(A2) |
申请公布日期 |
1990.08.22 |
申请号 |
EP19890123324 |
申请日期 |
1989.12.16 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
DOBUZINSKY, DAVID M.;HAKEY, MARK C.;HOLMES, STEVEN J.;HORAK, DAVID V. |
分类号 |
C08G77/06;C08G77/48;C08G77/60;C09D183/00;C09D183/16;C23C14/14;C23C14/24;G03F7/075;G03F7/16;H01L21/027;H01L21/30;H01L21/312 |
主分类号 |
C08G77/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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