发明名称 Plasma forming electrode and method of using the same.
摘要 <p>In as far, plasma forming apperatus, an electrode of the kind, used in pairs disposed to face each other in spaced parallel relation in a reduced pressure treating chamber, and between which a radio frequency current power is applied to produce a plasma, is formed from preferably highly pure aluminium or an aluminium alloy, and has a chromic acid anodic surface film layer thereon. It has greatly improved durability when used for plasma treatment in the presence of fluorine containing gas.</p>
申请公布号 EP0383550(A2) 申请公布日期 1990.08.22
申请号 EP19900301527 申请日期 1990.02.13
申请人 NIPPON LIGHT METAL CO., LTD 发明人 MIYASHITA, TERUO;ITO KOICHI
分类号 C23C16/50;C23F4/00;H01J37/32;H01L21/205;H01L21/302;H01L21/3065;H01L21/31;H05H1/46 主分类号 C23C16/50
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