发明名称 |
Plasma forming electrode and method of using the same. |
摘要 |
<p>In as far, plasma forming apperatus, an electrode of the kind, used in pairs disposed to face each other in spaced parallel relation in a reduced pressure treating chamber, and between which a radio frequency current power is applied to produce a plasma, is formed from preferably highly pure aluminium or an aluminium alloy, and has a chromic acid anodic surface film layer thereon. It has greatly improved durability when used for plasma treatment in the presence of fluorine containing gas.</p> |
申请公布号 |
EP0383550(A2) |
申请公布日期 |
1990.08.22 |
申请号 |
EP19900301527 |
申请日期 |
1990.02.13 |
申请人 |
NIPPON LIGHT METAL CO., LTD |
发明人 |
MIYASHITA, TERUO;ITO KOICHI |
分类号 |
C23C16/50;C23F4/00;H01J37/32;H01L21/205;H01L21/302;H01L21/3065;H01L21/31;H05H1/46 |
主分类号 |
C23C16/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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