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经营范围
发明名称
TREATMENT OF POLYCRYSTALLINE SILICON FILM
摘要
申请公布号
JPH02209726(A)
申请公布日期
1990.08.21
申请号
JP19890030465
申请日期
1989.02.09
申请人
SEIKO EPSON CORP
发明人
IWAMATSU SEIICHI
分类号
H01L21/20;H01L21/84
主分类号
H01L21/20
代理机构
代理人
主权项
地址
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