| 摘要 |
<p>PURPOSE:To obtain a device of this design high in yield and reliability by a method wherein a lower wiring is formed in a two-layered or more conductive layer at least at a contact hole or around it, and a surface contamination layer is constantly and uniformly removed to obtain a uniform and low contact resistance. CONSTITUTION:A lower wiring or an electrode 11 is formed of a laminated body composed of metal layers 11a and 11b different from each other in kind. Then, the lower wiring is patterned into a specified shape through etching, and an insulating layer 13 is deposited on the whole face of the lower wiring. The insulating layer 13 is etched using a photoresist 17 as a mask to form a contact hole 16. Then, a lower electrode exposed at the contact hole 16 is cleaned through etching such as a dry etching by the use of a mixed gas of CCl4 and O2 or a wet etching by the use of a mixed solution of ceric ammonium nitrate, perchloric acid, and water. And, after cleaning, only a Cr layer 11b can be selectively cleaned in the region of the contact hole 16 and an Al layer 11a of a base is left unchanged, so that a contact resistance uniform and low can be obtained.</p> |
